用于多种组装技术的厚膜导体复合结构

厚膜导体Ｐｄ－Ａｇ／Ａｕ、Ｐｔ－Ｐｄ－Ａｕ／Ａｕ平面复合结构，Ｐｄ－Ａｇ／Ａｕ立体复合结构可使多种组装技术相互兼容。立体复合结构还可有效地降低导体线电阻，减少线损耗。而且，其超声键合性尤佳     

Photo-reversible Reaction in Polymer Langmuir-Blodgett Films

Preparation of photoreactive Langmuir-Blodgett (LB) films was carried out using polymers/oligomers prepared from long-chain dialkyl esters of di-and tetra-olefins and having cyclobutane rings in the main chain. These polymers/oligomers formed stable monolayers on a water surface when mixed with arachidic acid. These monolayers could be deposited onto a substrate successfully forming Y-type films. The oligomer LB films were polymerized on irradiation. The polymer LB films showed a photo-reversible process between polymers and oligomers, depending on wavelength of the irradiating light. On the basis of spectral data and molecular weight change, this behaviour was found to be caused by cleavage and formation of cyclobutane rings.     

Modification of poly(N-vinyl-carbazole) thin films by bromine doping

Poly(N-vinyl-carbazole) (PVK) thin films doped with bromine has been studied by scanning electron microscopy, X-ray diffraction, infrared absorption, X-ray photoelectron spectroscopy (XPS), electron spin resonance (ESR), optical transmission (visible, near ultra violet) and conductivity measurements. The polymer has been doped at room temperature and at 373 K. It is shown by ESR, XPS and optical measurements that a charge transfer complex (CT-complex) is formed between PVK and Br. However, if some bromine acts as dopant of the polymer there is another bromine contribution, which corresponds to bromine covalently bonded to PVK and some only adsorbed. It is also shown by ESR that there is not only polymer doping by bromine but also some partial polymer degradation. Therefore, it can be said that the optimum doping condition of PVK thin films with bromine has been shown to be room temperature post-doping.     

Local Enrichment of Active Element Y in Y-modified PVD Films on Mild Steel Substrate

By means of EPMA,SIMS and XTEM tech-niques,the element distribution at the transitionzone of Y-modified ion plated titanium andtitanium nitride film on A3 steel substrate and thevariation of the element content on the surface ofthe evaporation source before and after service werestudied in detail.A mode was proposed in terms ofpreferential evaporation and micro-tunnel trans-portation of Y at the interface of film/substrate.     

Growth rate and surface microstructure in α(6H)–SiC thin films grown by chemical vapor deposition

Monocrystalline 6H-SiC thin films have been epitaxially grown on off-axis 6H-SiC {0001} substrates in the temperature range of 1623–1873 K via chemical vapor deposition. The growth rate was a strong function of the growth temperature and the reactant gas concentration. The activation energies for growth were 64 kJ/mole and 55 kJ/mole for the (0001) Si face and the (0001) C face, respectively. The concentration of growth pits in the films increased as a function of decreasing deposition temperature, increasing concentration of reactant gases and increasing off-axis orientation. Beta-SiC islands were also observed in the epilayers when the (SiH₄ + C₂H₄)/H₂ ratio was ≥2.5:3000.     

Off-Optimum Cure of Aerospace Epoxy Adhesives

Four epoxy film adhesives used in aircraft manufacture and repair have been examined to establish the effect of deviation from the cure cycle specified by the manufacturer. In addition to the variation of the cure cycle, two surface preparations of the aluminium adherends (chromic acid etch or grit blast followed by silane treatment) were evaluated. Thermal analysis was used to examine the cure envelope of the adhesive, and its extent of cure and glass transition temperature. The adhesive properties were assessed by shear strength (in both single lap joints and in Iosipescu configuration), durability (Boeing wedge test) and chemical resistance to selected aggressive fluids. The sensitivity of the performance of a particular adhesive to offoptimum cure conditions depends on its composition and needs to be determined, not predicted.     

Hydride Vapor Phase Epitaxy of GaN Thick Films by the Consecutive Deposition Process Using GaCl3

GaN buffer and main layers were grown by the conventional hydride vapor phase epitaxy technique using GaCl₃ consecutively. The deposited buffer layers were investigated by atomic force microscopy and X-ray analysis. To examine the behavior of the buffer layers at main layer growth temperature, heat treatment was conducted at 900°C. Based on the results of the buffer layer study, GaN thick films were grown at 1050°C. Optimum deposition conditions of buffer layer from the buffer and main layer studies generally coincided. On the φ scanning pattern, the GaN films grown on (0001) Al₂O₃ were single-crystalline. Band-edge emission dominated photoluminescence was observed at room temperature.     

Study on Oxygen-Sensing Properties of LaNiO3 Thin Films

The synthesis of rare-earth perovskite-type composition thin films of LaNiO₃ by means of the inorganic-sol-gel (ISG) method was studied. The structural stability under high temperature in reducing atmospheres and the oxygen-sensitivity mechanism of the LaNiO₃ thin films were examined. It is shown that under the experimental conditions, LaNiO₃ decomposes and the valance states of nickel are +2 and +3.     

波分复用系统中的交错复用器(Interleaver)技术

鉴于波分复用技术已成为光纤通信的发展方向，介绍几种新型的交错复用器的原理、结构等情况，对各种器件进行了比较。     

(Fe_(0.86)Zr_(0.033)Nb_(0.033)B_(0.068)Cu_(0.01))_x(Al_2O_3)_(1-x)颗粒膜的霍耳效应

用磁控溅射方法制备了系列 (Fe0 .86 Zr0 .0 33Nb0 .0 33B0 .0 6 8Cu0 .0 1 ) x(Al2 O3) 1 -x颗粒膜样品 ,体积百分比x从 0 .3 3～ 0 .63 ,样品厚度约为10 0nm。室温下在Fe0 .86 Zr0 .0 33Nb0 .0 33B0 .0 6 8Cu0 .0 1 体积百分比x =0 .43时得到 17.5 μΩ·cm的最大饱和霍耳电阻率 ,比纯铁磁金属提高了 3～ 4个量级。对其磁性和微结构进行了研究 ,样品霍耳电阻率随外场的变化曲线 ρxy～H与磁场平行于膜面时的磁化曲线M～H有相似性 ,说明霍尔电阻率 ρxy与磁化强度M相关。样品电阻率 ρxx随金属体积百分比x的减小而增加 ,在x =0 .43附近发生突变 ,从金属导电变为绝缘体。根据微结构和输运性质对可能的机制进行了探讨